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On correlation between fractal dimension and profilometric parameters in characterization of surface topographies

This study reports and discusses the results of investigation of correlation between fractal dimensions DEIS inferred from electrochemical impedance spectroscopy measurements and profilometric parameters obtained by contact (stylus) and non-contact (laser) profilometric methods. The research, conducted on two types of printing plates with different aluminium oxide surface topographies, revealed that there exists a good correlation between DEIS and certain profilometric parameters, although there are significant differences in values of roughness parameters inferred from stylus method in respect to these inferred from the non contact measurements. The best correlation, regardless of the applied method or printing plate type, exists between DEIS and the average surface roughness parameter Ra. Generally, better correlation between fractal dimension and profilometric parameters is observed for parameters inferred from contact measurements than for those obtained by non-contact (laser) methods. The correlations between fractal dimension DEIS, which is a very good descriptor of overall surface topography, and various profilometric parameters, provide significant information on the surface topography and an additional insight into processes responsible for its changes.

Profilometry ; Electrochemical impedance spectroscopy ; Fractal dimension

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