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Deep level defects in oxygen doped EFG poly-Si (CROSBI ID 481316)

Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija

Pivac, B. ; Borjanović, V. ; Kovačević, I. ; Zulim, I. Deep level defects in oxygen doped EFG poly-Si // Proceedings of 28th IEEE Photovoltaic Specialist Conference. Anchorage (AK): Institute of Electrical and Electronics Engineers (IEEE), 2000. str. 276-279

Podaci o odgovornosti

Pivac, B. ; Borjanović, V. ; Kovačević, I. ; Zulim, I.

engleski

Deep level defects in oxygen doped EFG poly-Si

There is a considerable current interest in polycrystalline silicon and edge-defined film-fed growth (EFG) technique is suitable candidate for the low-cost solar cell production. Recently, it has been shown that oxygen addition during the crystal growth yields a higher efficiency solar cells. We studied deep levels associated with structural defects like dislocations and grain boundaries, and influence of oxygen addition to the bulk on the picture of deep levels in the material. We have shown that levels attributed to dislocations are directily influenced by oxygen addition. We have also found that such levels originate predominantly from grain boundaries and to lesser extent from intragrain regions.

oxygen doped EFG poly-Si

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Podaci o prilogu

276-279.

2000.

objavljeno

Podaci o matičnoj publikaciji

Anchorage (AK): Institute of Electrical and Electronics Engineers (IEEE)

Podaci o skupu

28th IEEE Photovoltaic Specialist Conference-2000

poster

15.09.2000-22.09.2000

Anchorage (AK), Sjedinjene Američke Države

Povezanost rada

Fizika